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Influence of the atomic layer deposition temperature on the structural and electrical properties of Al/Al2O3/p-Ge MOS structures

Martha A. Botzakaki,George Skoulatakis, Nikolaos Xanthopoulos,Violetta Gianneta,Anastasios Travlos,Stella Kennou,Spyridon Ladas,Christos Tsamis,Eleni Makarona,Stavroula N. Georga,Christoforos A. Krontiras

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films（2018）

引用 9|浏览7
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