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Effect of Cl2 plasma treatment and annealing on vanadium based metal contacts to Si-doped Al0.75Ga0.25N

Mickael Lapeyrade,Sabine Alamé,Johannes Glaab,Anna Mogilatenko,Ralph-Stephan Unger,Christian Kuhn,Tim Wernicke,Patrick Vogt,Arne Knauer,Ute Zeimer,Sven Einfeldt,Markus Weyers,Michael Kneissl

Journal of Applied Physics（2017）

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