Effect of Al2O3 passivation layer on the stability of aluminum-indium-zinc oxide thin film transistors

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena(2017)

Cited 12|Views1
No score
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined