Post-Cleaning Effect on a HfO2 Gate Stack Using a NF3/NH3 PlasmaMin-Seon Lee,Hoon-Jung Oh,Joo-Hee Lee,In-Geun Lee,Woo-Gon Shin,Kyu-Dong Kim, Jin-Gu Park,Dae-Hong KoJournal of Nanoscience and Nanotechnology(2016)引用 0|浏览2暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要