Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O2/N2/CHF3 PlasmaMin Hwan Jeon,Jin Woo Park,Deok Hyun Yun,Kyong Nam Kim,Geun Young YeomJournal of Nanoscience and Nanotechnology（2015）引用 8|浏览1AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
