Effects of Film Thickness on Laser Induced Voltage (LIV) of La_2/3Ca_1/3MnO₃:Ag_0.05 Thin Films Grown on LaAlO₃ Substrates

La2/3Ca1/3MnO3:Ag0.05(LCMO:Ag0.05) thin films were prepared on vicinal cut LaAlO3(LAO) substrates with various film thicknesses by pulsed laser deposition technique (PLD). XRD results show that all the samples are shown along the (00l) orientation in orthorhombic structure with Pbnm space group. While the film thickness is around 450nm, the optimum LIV effects of the epilayer thin film have been obtained. The LIV effects enhancement of the LCMO:Ag0.05 thin films due to the photon scattering effects have been restrained and anisotropic seebeck coefficient improved.