Dose control strategy using random logic device patterns and massive metrology in a foundry high volume manufacturing environment

One of the most critical challenges for lithography process is to effectively control all critical patterns over one field, across wafer, and from lot to lot consistently. With design rules shrink, the lithography process has become more vulnerable, and the critical patterns control becomes more and more challenging. ASML Imaging optimizer (IMO) dose control has been widely adopted to control CDU ...