Contour Based Solution For Identifying Mask Induced Error

The Lithography is the key process for the semi-conductor foundry industry, consists of a bunch of factors such as: OPC error, exposure tool error, and mask error et al. Mask-related issue, as a key factor affecting process window, which is very difficult to identify by conventional method [1]. Furthermore, mask inspection and measurement consumes large resource to find out the relationship betwee...