Enhanced diffusion barrier property of nanolayered NbMoTaW/TiVCr high entropy alloy for copper metallization

P.F. Li, Y.J. Ma, H. Ma, S. Ta,Z. Yang, X.T. Han, M. Kai,J.H. Chen,Z. Cao

Journal of Alloys and Compounds（2021）

引用 6|浏览3

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摘要

•Multilayered amorphous HEA film as barrier layer has been prepared by dc magnetron sputtering.•The multilayered HEA exhibits an excellent diffusion barrier property.•The high dense interface and severe lattice distortion are responsible for the improved barrier property.

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