Remote Surface Roughness Scattering in FDSOI devices with high-κ/SiO2 gate stacks

Y. M. Niquet,I. Duchemin,V.-H. Nguyen, F. Triozon,D. Rideau

semanticscholar（2021）

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摘要

X iv :1 50 4. 01 88 1v 1 [ co nd -m at .m tr lsc i] 8 A pr 2 01 5 Remote Surface Roughness Scattering in FDSOI devices with high-κ/SiO2 gate stacks Y. M. Niquet, 2, a) I. Duchemin, 2 V.-H. Nguyen, 2 F. Triozon, 2 and D. Rideau CEA, INAC-SP2M, L Sim, 17 rue des Martyrs, 38054 Grenoble, France Univ. Grenoble Alpes, 17 rue des Martyrs, 38054 Grenoble, France CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble, France STMicroelectronics, 850 Rue Jean Monnet, 38920 Crolles, France

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