Gate tuning of fractional quantum Hall states in an InAs two-dimensional electron gas

S. Komatsu,H. Irie,T. Akiho, T. Nojima, T. Akazaki,K. Muraki

PHYSICAL REVIEW B(2022)

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摘要
We report the observation of fractional quantum Hall (FQH) effects in a two-dimensional electron gas (2DEG) confined to an InAs/AlGaSb quantum well, using a dual-gated Hall-bar device allowing for the independent control of the vertical electric field and electron density. At a magnetic field of 24 T, we observe FQH states at several filling factors, namely nu = 5/3, 2/3, and 1/3, in addition to the nu = 4/3 previously reported for an InAs 2DEG. The nu = 4/3 and 5/3 states, which are absent at zero back-gate voltage, emerge as the quantum well is made more symmetric by applying a positive back-gate voltage. The dependence of zero-field electron mobility on the quantum-well asymmetry reveals a significant contribution of interface-roughness scattering, with much stronger scattering at the lower InAs/AlGaSb interface. However, the dependence of the visibility of the FQH effects on the quantum-well asymmetry is not entirely consistent with that of mobility, suggesting that a different source of disorder is also at work.
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