Exploiting Fixed Charge To Control Schottky Barrier Height In Si Vertical Bar Al2o3 Vertical Bar Moox - Based Tunnel Diodes

The insertion of a tunneling atomic layer deposited (ALD) Al2O3 film between MoOx and p-type Si has been studied to investigate Schottky barrier height tunability with varied negative fixed charge density. This work seeks to increase the hole-selectivity of MoOx-based contacts through manipulation of interface fixed charge. Fixed charge density and interface trap state densities are determined as a function of alumina processing conditions in metal-oxide-semiconductor capacitors (MOSCAPs). Schottky barrier heights were determined from Mott-Schottky analysis of tunnel diodes. An alumina deposition temperature of 80 degrees C and post-deposition annealing at 425 degrees C yielded the highest magnitude of negative fixed charge density (-3.5x10(12) q.cm(-2)). High deposition temperature and/or post-deposition annealing produced the lowest interface trap state density (1x10(12) eV(-1).cm(-2)). On p-type silicon, Schottky barrier height minimization was not clearly correlated with increasing fixed charge density. However, on n-type silicon, a significant increase in Schottky barrier height was evident (similar to 0.8 eV to > 1 eV) and is attributed to the large negative fixed charge. The findings from this work indicate that Schottky barrier height in carrier selective contacts can be tuned by electrostatic engineering of the SiOx vertical bar Al2O3 interface.