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Producing And Controlling Substrate Temperature Uniformity From 600 Degrees Cto 1100 Degrees C In Cvd Rotating Disk Reactors

Ai Gurary,Gs Tompa,Ra Stall, Wj Kroll, P Zawadzki,Ne Schumaker

CHEMICAL VAPOR DEPOSITION OF REFRACTORY METALS AND CERAMICS III（1995）

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