Effects Of Ne/Xe Gas Mixture Ratio On Sputtering Rate Of Mgo Protective Layer

Kyohei Yoshino, Kazuya Nomoto,Masashi Goto,Ryuichi Murai,Takuji Tsujita,Masaharu Terauchi,Yukihiro Morita,Mikihiko Nishitani,Masatoshi Kitagawa

IDW'11: PROCEEDINGS OF THE 18TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3（2011）

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摘要

The effects of the Ne/Xe gas mixture ratio on the sputtering rate of the MgO protective layer were investigated by using panels and calculating results. With increases in the Xe concentration in the Ne/Xe gas mixture, the sputtering rate increased and decreased in the Xe concentration ranges of 10-50% and 50-100%, respectively. These results showed that super high Xe PDPs, whose concentrations were over 80%, achieved high luminous efficiency and long life.

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