Study Of Transient Photoconductivity Of Gan Epilayer Grown By Metalorganic Chemical Vapor Deposition

1998 5TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY PROCEEDINGS(1998)

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Abstract
The transient photoconductivity(PC) properties of GaN thin film on (0001) sapphire substrate are investigated. The decay curves of PC obtained by YAG:Nd pulsed laser are divided into two special regions, which are the beginning and tail decay regions, corresponding to two time constants, 0.1 ms and 1.0 ms, respectively. Keeping the same light intensity and bias voltage, when the sample is heated to 300 degrees C, the time constants are both reduced. It shows that there are a large number of naps at the position of tens of meV below the conduction band edge. The PC ascends S-shaped when the data are collected during the first 200 ns. As the sample is not shined, the PC sharply reduces and oscillates, indicating that the carriers redistribute between the deep naps and the conduction band. As an approximation, a model involving two trapping levels, the shallow and the deep napping levels to represent the structure of the electron napping Levels in the gap. The simulation based on this model is well according with the experimental results. Moreover, the mechanism of the PC curves varied as the light intensity is explained by the model.
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Key words
III-V semiconductors,MOCVD coatings,deep levels,electron traps,gallium compounds,photoconductivity,semiconductor epitaxial layers,(0001) sapphire substrate,300 degC,Al2O3,GaN,MOCVD,bias voltage,conduction band,deep levels,deep traps,epitaxial layer,light intensity,shallow levels,thin film,transient photoconductivity,
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