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How We Are Making the 0.5-NA Berkeley Mirco-Field Exposure Tool Stable and Productive

Chris Anderson,Arnaud Allezy,Weilun Chao, Lucas Conley,Carl Cork, Will Cork,Rene Delano,Jason DePonte,Michael Dickinson,Geoff Gaines,Jeff Gamsby,Eric Gullikson,Gideon Jones,Lauren McQuade,Ryan Miyakawa,Patrick Naulleau,Seno Rekawa,Farhad Salmassi, Brandon Vollmer, Daniel Zehma, Wenhua Zhua

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI（2020）

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EUV,High-NA,MET,Microfield Exposure Tool,Photoresist,Berkeley Lab,LBNL,CXRO
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