Experimental characterization of Inverse- Designed Vertical Grating Couplers in the O-band

2021 ANNUAL CONFERENCE OF THE IEEE PHOTONICS SOCIETY (IPC)(2021)

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摘要
We perform wafer-level testing of perfectly vertical grating couplers in a c-Si 193nm DUV immersion lithography process. We designed single polarization grating couplers using the adjoint method and experimentally obtain an insertion loss of 1.91dB, a 18.9nm 1dB-bandwidth, and <-10dB in-waveguide reflection.
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关键词
Silicon photonics, Gratings, Photonic integrated circuits
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