Fabrication and Characterisation of Resistive Nanocrystalline Graphite

S.M. Sultan,S.H. Pu,S.J. Fishlock,H.M.H. Chong,L.H. Wah,J.W. McBride

2021 IEEE Regional Symposium on Micro and Nanoelectronics (RSM)（2021）

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摘要

This work demonstrates the feasibility of fabricating resistive nanocrystalline graphite (NCG) on a Si substrate. The NCG film thickness of 9 nm was deposited using metal-free plasma enhanced chemical vapour deposition (PECVD) on a 6-inch p-type silicon wafer. The surface and electrical properties of the resistors produced were investigated. The average grain size of the NCG thin film is 35 nm wit...

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关键词

nanocrystalline graphite,resistor,plasma enhanced chemical vapor deposition,grain boundaries

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