The phenolic acids from Oplopanax elatus Nakai stems and their potential photo-damage prevention activity

25 phenolic acids, including four new isolates, eurylophenosides A–D ( 1 – 4 ) and 21 known ones ( 5 – 25 ) were isolated and identified from the stems of Oplopanax elatus Nakai. Among the known compounds 5 – 9 , 11 – 13 , 16 , 18 – 25 were isolated from the genus for the first time; 17 was first obtained from the plant; and the NMR data of 22 was reported here first. Meanwhile, the UVB-induced photodamage model of HaCaT cells was used to study the prevent-photodamage abilities of compounds 1 – 2 , 4 – 8 , 11 – 13 and 15 – 25 with a nontoxic concentration at 50 μM. Moreover, a dose-dependent experiment was conducted for active compounds at the concentration of 10, 25, and 50 µM, respectively. Consequently, pretreatment with compounds 1 , 16 , 17 , 19 , 20 , 22 , 24 and 25 could suppress the cell viability decreasing induced by UVB irradiation in a concentration-dependent manner. These results indicated that phenolic acids were one kind of material basis with prevent-photodamage activity of O. elatus . Graphic abstract