Sensitivity of quantitative symmetry measurement algorithms for convergent beam electron diffraction technique

Hyeongsub So, Ro Woon Lee, Sung Taek Hong,Kyou-Hyun Kim

Applied microscopy(2021)

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摘要
We investigate the sensitivity of symmetry quantification algorithms based on the profile R-factor ( R p ) and the normalized cross-correlation (NCC) coefficient ( γ ). A DM (Digital Micrograph © ) script embedded in the Gatan digital microscopy software is used to develop the symmetry quantification program. Using the Bloch method, a variety of CBED patterns are simulated and used to investigate the sensitivity of symmetry quantification algorithms. The quantification results show that two symmetry quantification coefficients are significantly sensitive to structural changes even for small strain values of < 1%.
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关键词
Convergence beam electron diffraction,Symmetry,Transmission electron microscopy
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