Imaging Array and Complementary Photosensitive Inverter Based on P-Type SnO Thin-Film Phototransistors

IEEE ELECTRON DEVICE LETTERS(2021)

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Abstract
P-type tinmonoxide (SnO) thin-film phototransistors were developed with high photoresponsivity of 2.94 x 10(5) A/W and high detectivity of 1.82 x 10(14) Jones, and these values are, to the best of our knowledge, among the highest for the reported oxide-semiconductor-based phototransistors. The excellent performances of these phototransistors were further demonstrated by incorporating the devices into a 10x10 array to successfully image a letter "A" pattern. Furthermore, by integration of n-type indium gallium zinc oxide and p-type SnO thin-film phototransistors, we realized a complementary photosensitive inverter. The inverter exhibits excellent photoresponse with a high voltage gain rate change of 194%. Our results indicates that the SnO based phototransistors have great potential in thin-film photoelectronic circuits and systems.
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Key words
Phototransistors,Inverters,Optimized production technology,Electric potential,Tin,Thin film transistors,Logic gates,Tin monoxide (SnO),thin-film phototransistors,imaging array,indium gallium zinc oxide (InGaZnO or IGZO),complementary photosensitive inverter
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