2-D Simulation of the Electron Density Characteristics of a Special Plasma Device

The purpose of this article is to study the influence of different powers, pressures, frequencies, and gases on the electron density distribution in special structures. A simulation model is established, and the electronic density in a special capacitance coupled plasma (CCP) device is calculated over the power range of 0–10 kW, pressure range of 0–50 Pa, and frequency range of 13.56–300 MHz. The ...