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6.5 kV SiC Power Devices with Improved Blocking Characteristics against Process Deviations

JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE(2021)

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摘要
Edge termination structures that are insensitive to process deviations were investigated to obtain 6.5 kV SIC power devices with stable blocking characteristics. Edge terminations were designed and verified by a TCAD simulation in consideration of undesirable surface charge states and variation of the implantation window in the termination region. A constant-space floating guard ring (CS-FGR) was sensitive to the variation of the implantation window. A gradually increasing space (GIS) FGR was less sensitive to process deviations than the CS-FGR. We concluded that the GIS-FGR is sufficiently stable for use in high-voltage SiC devices at surface charge densities (Q(surf)/q) of 0 to -1 x 10(12) cm(-2) and implantation window variations of -0.3 to +0.3 mu m. The optimized GIS-FGR exhibited a high breakdown voltage of over 8 kV at all the Q(surf)/q valnes and in the implantation window variation range considered in this paper.
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关键词
SiC, power device, Edge termination, JTE, FGR
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