First Study of P-Channel Vertical Split-Gate Flash Memory Device with Various Electron and Hole Injection Methods and Potential Future Possibility to Enable Functional Memory Circuits

2021 IEEE International Memory Workshop (IMW)(2021)

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摘要
Recently, we have developed a novel vertical split-gate Flash (or vertical 2T NOR) architecture in a n-channel device. In this work, we further develop the p-channel device counterpart, and demonstrate 4 different electron and hole injection methods, including band-to-band tunneling-induced hot-electron (BBHE), +FN electron, source-side injection hot-hole (SSIH), and-FN hole injections. The split-...
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关键词
Degradation,Electric potential,Field programmable analog arrays,Charge carrier processes,Split gate flash memory cells,Hot carriers,Transistors
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