First Study of P-Channel Vertical Split-Gate Flash Memory Device with Various Electron and Hole Injection Methods and Potential Future Possibility to Enable Functional Memory Circuits
2021 IEEE International Memory Workshop (IMW)(2021)
摘要
Recently, we have developed a novel vertical split-gate Flash (or vertical 2T NOR) architecture in a n-channel device. In this work, we further develop the p-channel device counterpart, and demonstrate 4 different electron and hole injection methods, including band-to-band tunneling-induced hot-electron (BBHE), +FN electron, source-side injection hot-hole (SSIH), and-FN hole injections. The split-...
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关键词
Degradation,Electric potential,Field programmable analog arrays,Charge carrier processes,Split gate flash memory cells,Hot carriers,Transistors
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