Ge Photodiode with -3 dB OE Bandwidth of 110 GHz for PIC and ePIC Platforms

S. Lischke,A. Peczek, F. Korndorfer,C. Mai, H. Haisch, M. Koenigsmann, M. Rudisile, D. Steckler, F. Goetz, M. Fraschke,S. Marschmeyer,A. Kruger,Y. Yamamoto,D. Schmidt, U. Saarow,P. Heinrich, A. Kroh, M. A. Schubert, J. Katzer, P. Kulse,A. Trusch,L. Zimmermann

2020 IEEE International Electron Devices Meeting (IEDM)(2020)

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摘要
We present an SOI-waveguide coupled germanium photodiode with very high OE -3 dB bandwidth of ≥110 GHz at reverse bias of 2 V. This performance is achieved by a novel construction in that the germanium is sandwiched in between two in-situ doped silicon regions. This fabrication approach allows for avoiding ion-implantation into the germanium, which is certainly beneficial for the bandwidth as minority carrier diffusion effects are strongly suppressed. A responsivity of >0.6 A/W at 1550 nm (-2 V) is achieved, while the dark current of this device yields to about 300 nA (-2 V). To our knowledge, this is the most advanced germanium photo detector in terms of bandwidth combined with state-of-the-art responsivity as well as moderate dark currents. We demonstrate that the novel photodiodes can be fabricated with high yield.
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关键词
SOI-waveguide coupled germanium photodiode,reverse bias,in-situ doped silicon regions,ion-implantation,minority carrier diffusion effects,advanced germanium photo detector,state-of-the-art responsivity,moderate dark currents,ePIC platform,PIC platform,dark current,voltage 2.0 V,Ge-Si
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