A Global Shutter Wide Dynamic Range Soft X-Ray Cmos Image Sensor With Backside-Illuminated Pinned Photodiode, Two-Stage Lateral Overflow Integration Capacitor, And Voltage Domain Memory Bank

IEEE TRANSACTIONS ON ELECTRON DEVICES(2021)

引用 9|浏览9
暂无评分
摘要
This article presents a prototype 22.4 mu m pixel pitch global shutter (GS) wide dynamic range (WDR) soft X-ray CMOS image sensor (sxCMOS). Backside-illuminated (BSI) pinned photodiodes with a 45-mu m thick Si substrate were introduced for low noise and high radiation hardness to high energy photons. Two-stage lateral overflow integration capacitor (LOFIC) and voltage domain memory bankwith high-densitySi trench capacitorswere introduced for WDR and for GS. The developed sxCMOS achieved maximum 21.9 Me- full well capacity with a single exposure 129 dB dynamic range by GS operation. Over 70% quantum efficiency (QE) toward soft X-ray was successfully achieved. The developed prototype sxCMOS is a step forward toward a 4 M pixel detector system to be utilized in next-generation synchrotron radiation facilities and X-ray free-electron lasers.
更多
查看译文
关键词
Backside-illuminated (BSI), CMOS image sensor (CIS), coherent X-ray diffraction imaging (CDI), global shutter (GS), lateral overflow integration capacitor (LOFIC), soft X-ray, wide dynamic range (WDR)
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要