Chamber and Recipe- Independent FDC indicator in High - mix Semiconductor Manufacturing
2020 International Symposium on Semiconductor Manufacturing (ISSM)(2020)
Abstract
This paper describes a chamber and recipe-independent FDC (fault detection and classification) indicator with an example of detecting abnormal discharge in aluminum sputtering tools. The indicator is developed using simple equations and is improved by an engineer with legacy FDC system to minimize false alarms which cause the reduction of an equipment productivity. Besides, the indicator is introduced into newly installed tools and prevent scrap wafers at minimum.
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Key words
Fault detection and classification (FDC),indicator,sputter,abnormal discharge
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