Thermodynamic calculations for the chemical vapor deposition of silicon carbide

Chemischer InformationsdienstVolume 14, Issue 45 Physical Inorganic Chemistry ChemInform Abstract: THERMODYNAMIC CALCULATIONS FOR THE CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE A. I. KINGON, A. I. KINGONSearch for more papers by this authorL. J. LUTZ, L. J. LUTZSearch for more papers by this authorR. F. DAVIS, R. F. DAVISSearch for more papers by this author A. I. KINGON, A. I. KINGONSearch for more papers by this authorL. J. LUTZ, L. J. LUTZSearch for more papers by this authorR. F. DAVIS, R. F. DAVISSearch for more papers by this author First published: November 8, 1983 https://doi.org/10.1002/chin.198345019AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinkedInRedditWechat No abstract is available for this article. Volume14, Issue45November 8, 1983 RelatedInformation