多靶磁控溅射镀膜设备及其特性
wf(2016)
Abstract
介绍了一种多靶磁控溅射镀膜设备,阐述了镀膜室、工件台、阴极溅射靶、辅助离子源、真空系统等关键部件的设计思想。镀膜工艺结果显示,设备满足工艺要求,膜层均匀性优于±3%。
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