Cfd Approach To Investigating Electrochemical Hydrodynamics And Mass Transport In A Copper Electrodeposition Process Using A Rotating Disk Electrode

Three-dimensional electrochemical mass transport and concentration gradient distributions on a rotating disk electrode (RDE) were simulated in a copper electrodeposition system. This approach is based on solving the electrochemical reaction kinetics under diffusion-controlled mass transport using the Computational Fluid Dynamics (CFD) coupling technique. Diffusive boundary layer thicknesses were locally derived in association with the concentration gradient under a galvanostatic electrolysis. The simulated average diffusion boundary layer thicknesses over the electrode surface were well matched with those from the Levich correlation.