Metrology of a Focusing Capillary Using Optical Ptychography.

SENSORS(2020)

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摘要
The focusing property of an ellipsoidal monocapillary has been characterized using the ptychography method with a 405 nm laser beam. The recovered wavefront gives a 12.5x10.4 mu m(2) focus. The reconstructed phase profile of the focused beam can be used to estimate the height error of the capillary surface. The obtained height error shows a Gaussian distribution with a standard deviation of 1.3 mu m. This approach can be used as a quantitative tool for evaluating the inner functional surfaces of reflective optics, complementary to conventional metrology methods.
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关键词
X-ray capillary optics,X-ray microscopy,ptychography
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