Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-Nm FinFET Vehicle
IEEE Transactions on Electron Devices（2020）
Key words
Semiconductor device modeling,Logic gates,Calibration,Fabrication,Performance evaluation,Semiconductor process modeling,FinFETs,14-nm fin field effect transistor (FinFET),process variation,sensitivity analysis,simulation
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