Atomic-Scale Imaging Of Polarization Switching In An (Anti-)Ferroelectric Memory Material: Zirconia (Zro2)

2020 IEEE SYMPOSIUM ON VLSI TECHNOLOGY(2020)

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摘要
Direct, atomic-scale visualization of polarization switching in a functional, polycrystalline, binary oxide via in-situ high-resolution transmission electron microscopy (HRTEM) biasing is reported for the first time. Antiferroelectric (AFE) ZrO2 was used as the model system, which is important for commercial DRAMs and as emerging NVMs (through work-function engineering). We observed (1) clear shifting and coalescing of domains within a single grain, and (2) dramatic changes of the atomic arrangements and crystalline phases-both at voltages above the critical voltage measured for AFE switching. Similar synergistic in-situ structural-electrical characterization can pave the way to understand and engineer microscopic mechanisms for retention, fatigue, variability, sub-coercive switching and analog states in ferroelectric and AFE-based memory devices.
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关键词
atomic arrangements,single grain size,polycrystalline phase,critical voltage,antiferroelectric switching,sub-coercive switching,analog states,AFE-based memory devices,scale imaging,polarization switching,ferroelectric memory device,zirconia,atomic-scale visualization,high-resolution transmission electron microscopy,DRAMs,work-function,retention,fatigue,synergistic in-situ structural-electrical characterization,HRTEM,ZrO2
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