Enhanced Energy-Storage Performance Of An All-Inorganic, Antiferroelectric, Thin-Film Via Orientation Adjustments

IEEE ACCESS(2020)

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Abstract
An all-inorganic Pb0.99Nb0.02(Zr0.85Sn0.13Ti0.02)(0.98)O-3 (PNZST) antiferroelectric (AFE) thin film was designed to enhance its energy-storage performance by adjusting its orientation. Using a radio frequency (RF) magnetron sputtering technology, 450-nm-PNZST AFE films with (111), (110), and (100) crystal orientations were successfully prepared. All the films showed a dense microstructure and the highly preferred orientations were determined by the orientation of the bottom electrodes. Moreover, the preferred orientation of the AFE thin film had a great influence on the dielectric and energy-storage properties. Meanwhile, the energy storage density of the PNZST AFE thin film with the (100) orientation reached 33.7 J cm(-3), which was 43 % higher than that of PNZST AFE thin film with a (111) orientation. All of these results shed light on how the energy-storage performance of PNZST AFE thin films can be enhanced and optimized by adjusting its orientation. This offers a new strategy and innovation, which opens up a route to practical applications in micro-energy-storage systems.
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Key words
Energy storage,Sputtering,Silicon,Electrodes,X-ray scattering,Surface morphology,Radio frequency,Orientation,antiferroelectric thin film,energy-storage
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