Method Of Field Limiting Rings Spacing Parameter For Sic Jbs Based On Multiple Linear Regression And Polynomial Fitting

PROCEEDINGS OF THE 15TH IEEE CONFERENCE ON INDUSTRIAL ELECTRONICS AND APPLICATIONS (ICIEA 2020)(2020)

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摘要
Power semiconductor devices designers often use Silvaco for device simulation. At present, when designing device field limiting rings(FLRs) terminal, it needs to fine tune the relevant parameters gradually for getting the expected results, which costs a lot of time. In order to solve this problem, this paper takes the SiC JBS as an example, the basic parameters of JBS field limiting ring structure for simulation are determined by formula derivation and simulation analysis. Taking the initial spacing s of field limiting ring S and the change step of field limiting ring spacing k as independent variables. The simulation data are divided into test groups and verification groups randomly, the test group data are brought into polynomial fitting and multiple linear regression combined model for training, and then the data of verification group are diagnosed. The results show that the model has a exceedingly superior prediction accuracy, which provides a great reference for designers to quickly get the structure parameters of the field limiting ring during the simulation in Silvaco, which saves a lot of simulation time.
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关键词
field limiting rings, SiC JBS, polynomial fitting, multiple linear regression, Silvaco
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