Thermal stability and mechanical properties of sputtered (Hf,Ta,V,W,Zr)-diborides

Non-reactive magnetron sputtering of a diboride target composed of HfB2, TaB2, VB2, W2B5, and ZrB2 with equimolar composition leads to the formation of crystalline single-phase solid solution diboride thin films, (Hf,Ta,V,W,Zr)B2, with a high-entropy metal-sublattice. Their growth morphology (dense and fine-fibrous), crystal structure (AlB2-type), as well as mechanical properties (indentation modulus E of ~580 GPa and hardness H of ~45 GPa), and chemical compositions are basically independent of the substrate bias potential applied (varied between -40 and -100 V) during the deposition at 450°C.