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A Systematic Study on BEOL Defectivity Control for Future AI Application

James H.-C. Chen,Fee li Lie, Scott DeVries,Carol Boye,Sanjay Mehta,Thamarai S. Devarajan, Mary-Claire Silvestre,Wei-Tsu Tseng, Massud A. Aminpur

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)（2020）

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Abstract
In this paper, a case study on control of BEOL defectivity in a systematic way for the future AI application is presented. A few novel methodologies were introduced to identify the source of defectivity in various BEOL sectors, such as, patterning, barrier deposition, plating, and CMP. We successfully reduced the defectivity to the level required to yield target AI devices.
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Key words
BEOL,defectivity control,AI application
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