Impact Of Low Energy Ion Beams On The Properties Of Rr-P3ht Films

Two types of ions (fluorine and titanium) are implanted into films of regio-regular poly(3-hexylthiophene-2,5-diyl) (rr-P3HT) spin-coated on glass substrates with subsequent annealing in argon atmosphere to modify their electrical properties and structure. The ion energy and fluence were within 0.2-40 keV and 10(13)-10(15) cm(-2) respectively. The dc resistance enhances after the intensive ion beam treatment while the ac impedance decreases. Ti ion implantation with 40 keV energy and 10(14) cm(-2) fluence induces decrease of the ac impedance by almost two orders of magnitude and appearance of the molecular hydrogen features in H-1 NMR spectrum. The UV-VIS spectra of the films are blue shifted after their exposal to the ion beams, which correlates with the presence of oxygen. The ratio of the oxygen to carbon peak intensities (xi=O1s/C1s) in the XPS spectra is proposed as a measure for the local partial disturbance of the film. EPR spectra demonstrate formation of the paramagnetic states with g factor < 2, which is accompanied with the down-field shift of the NMR spectrum. The ion beams are found to have no significant etching effect as per results of the film thickness measurements and AFM images.