Gate-All-Around Transistors Based on Vertically Stacked Si Nanowires

ECS Transactions(2017)

Cited 9|Views6
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Abstract
We report on gate-all-around (GAA) N-and P-MOSFETs made of 8-nm-diameter vertically stacked horizontal Si nanowires (NWs). We show that these devices, which were fabricated on bulk Si substrates using an industry-relevant replacement metal gate (RMG) process, have excellent short-channel characteristics (SS = 65 mV/dec, DIBL = 42 mV/V for L-G = 24 nm) at performance levels comparable to FinFET reference devices. Furthermore, CMOS integration of GAA MOSFETs is demonstrated. Threshold voltage tuning is achieved by nanowire-compatible dual-work-function metal integration.
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