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Tribological study of hafnium dioxide and aluminium oxide films grown by atomic layer deposition on glass substrate

R. Pietruszka,B.S. Witkowski,S. Zimowski,T. Stapinski,M. Godlewski

Thin Solid Films（2020）

Cited 7|Views14
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Abstract
•Growth of thin films by atomic layer deposition method.•Mechanical properties of a hafnium dioxide and aluminium oxide films were studied.•High wear resistance of hafnium dioxide film.
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Key words
Atomic layer deposition,Thin films,Friction,Wear resistance
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