Structural characterization and continuous cellular automata simulation of micro structures by focused Ga ion beam induced deposition process

•The effects of process parameters in focused ion beam induced deposition are clarified.•The proposed model well predict the morphology of deposition structure, and some special structures.•The variation of diffusion intensity in the horizontal direction is considered to obtain a more accurate growth rate.•The relationship between process parameters and the morphology of deposition structure is established in a wide range.