NF₃ decomposition without water over Cr₂O₃ coated-Al₂O₃ reagents

NF3 emitted from semiconductor industry is a highly greenhouse gas. The decomposition of NF3 over some metal oxides in the absence of water is an effective method for its abatement. In this work, the Cr2O3 coated-Al2O3 reagents with various loadings of chromium were prepared and evaluated in NF3 decomposition reaction. The results show that the Cr/Al2O3 reagents are more active than bare Al2O3 due to the enhancement in the fluorination of Al2O3 substrate caused by the surface promoter Cr2O3. Furthermore, the reactivity of Cr/Al2O3 in this study is higher than that of other reagents reported previously.