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Ultimate Edge-Placement Control Using Combined Etch and Lithography Patterning Optimizations

Brennan Peterson,Rich Wise, Koen van der Straten,Katja Viatkina, Melisa Luca, Salman Mokhlespour,Michael Kubis,Giordano Cattani,David Hellin,Daniel Sobieski,Girish Dixit,Nader Shamma,Vito Rutigliani,Patrick Jaenen,Sandip Halder,Philippe Leray

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXV（2018）

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Key words
Immersion lithography,plasma etch,overlay,wafer edge
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