Influence of Multilayer Design and Post-Deposition Processing on Effective Photonic Properties of Silicon/Silicon Nitride Multilayer Structures

In this paper photonic properties of four planar silicon/silicon nitride multilayers deposited by PECVD and post-deposition processed have been studied and compared. Results from optical transmittance spectroscopy have been used to determine dispersive and absorptive photonic properties (refractive indices, absorption coefficients, optical band gaps and Yablonovitch absorptances) of multilayers considered as effective thin films. Apparent modifications of effective photonic properties corresponding to the sublayer thickness and post-deposition annealing have been observed which is meaningful for absorption-related applications.