CHARACTERIZATION OF THIN FILMS OF AlSiN GROWN ON SAPPHIRE SUBSTRATE

The silicon aluminum nitride thin film is promising for its physical properties as a good oxidation resistance, hard and thermally stability and new optical aplications. In this paper, we study AlSiN coatings, which were deposited on saphire substrates using a reactive magnetron sputtering system. Here, were studied the optical properties of AlSiN coatings at different temperatures. Scanning electron microscopy (SEM), Energy dispersive X-ray spectroscopy (EDX), Transmittance, Reflectance and micro-Raman spectroscopy techniques have been used to characterize the coatings. The phonons structure of the well adherent coatings was investigated by Raman spectroscopy, which revealed dominant Si peak about 521 cm(-1).