Microstructure Development in Multilayer TiBx/TiSiyCz Coatings during Post-Deposition Heat Treatment

Multilayer amorphous TiBx/TiSiyCz coatings were formed by duplex treatment: dual beam ion beam assisted deposition and pulsed laser deposition. Post-deposition heating was applied to activate crystallization in the coating. In situ transmission electron microscopy heating experiments were conducted in the temperature range 20-600 degrees C. Crystallization of TiB2 phase in TiBx layers begun at 450 degrees C, while TiSiyCz layers retained nearly amorphous up to 600 degrees C.