May 1992 DEMONSTRATING THE UTILITY OF BORON BASED PRECURSOR MOLECULES FOR SELECTIVE AREA DEPOSITION IN A SCANNING TUNNELING MICROSCOPE

The scanningtunnelling microscope (STM) can be usedto selectively deposit material from a gaseous precursor compound. Ultrasmall (less than a 100 nm across) spatial dimensions for selective area deposition may be achieved by this means. In this paper we outline a scheme forselecting and designing main group cluster compounds and organometallics for this type of selective area deposition using nido-decaborane(l4) as an example.