14-nm FinFET Technology for Analog and RF Applications

IEEE Transactions on Electron Devices(2018)

Cited 106|Views18
No score
Abstract
This paper describes the features and performance of an analog and RF device technology development on a 14-nm logic FinFET platform. An optimized single-side gate contact RF device layout shows a Ft/Fmax of 314/180 GHz and 285/140 GHz for N and PFinFET device, respectively. The double-side gate contact structure with contact on either end of active gate enhances the peak Fmax performance to 227 a...
More
Translated text
Key words
FinFETs,Logic gates,Radio frequency,Performance evaluation,Resistance,Silicon
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined