Accurate Measurements of Small Resistances in Vertical Interconnects with Small Aspect Ratios

2020 IEEE European Test Symposium (ETS)(2020)

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摘要
Resistance measurements of vertical interconnect elements by cross-bridge Kelvin resistors can yield values far below the expected value, if that resistance is calculated with the simple formula based on resistivity, interconnect length, and cross-sectional area; for small resistors, the measured value can even become negative. Analysis of current and potential distributions inside the simulated structures helps both to understand the causes of these non-realistic resistance values and to improve the design of the CBKR structures for preventing underestimation of the vertical interconnect resistance.
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关键词
resistance,vertical interconnect,cross-bridge Kelvin resistor,current and voltage distributions,field-solver,simulations
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