Underlayer Material Dependent Symmetric And Asymmetric Behavior Of Voltage-Controlled Magnetic Anisotropy In Cofeb Films

Voltage-controlled magnetic anisotropy (VCMA), observed at the interfaces of ultrathin ferromagnetic metallic films and oxide layer, has proven to be a useful tool for the development of all-electric field controlled spintronics devices. Here, we have studied the symmetric and asymmetric behavior of VCMA in CoFeB/MgO heterostructures, grown on different underlayer materials, by measuring ferromagnetic resonance using spin pumping and inverse spin Hall effect technique. We observe symmetric behavior of VCMA in CoFeB films with Ta underlayer, whereas a systematic transformation from symmetric to asymmetric behavior of VCMA with decreasing CoFeB thickness is observed for Pt underlayer. We speculate that the increased interfacial roughness, defects and strain of ultrathin CoFeB films with Pt buffer layer probably leads to the complicated band structure at CoFeB/MgO interface resulting in asymmetric behavior of VCMA. The observed symmetric behavior of VCMA in control samples justifies the role of interfacial roughness, defects and discards the role of oxide overlayer on the observed asymmetric behavior of VCMA in ultrathin CoFeB films.